发明名称 |
INSPECTION APPARATUS |
摘要 |
An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven. |
申请公布号 |
US2015340193(A1) |
申请公布日期 |
2015.11.26 |
申请号 |
US201514813768 |
申请日期 |
2015.07.30 |
申请人 |
EBARA CORPORATION |
发明人 |
YOSHIKAWA Shoji;TSUKAMOTO Kiwamu;MURAKAMI Takeshi;HATAKEYAMA Masahiro;KARIMATA Tsutomu |
分类号 |
H01J37/02;H01J37/20;H01J37/285 |
主分类号 |
H01J37/02 |
代理机构 |
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代理人 |
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主权项 |
1. An inspection apparatus for inspecting sample surface using an electron beam, comprising:
an electron beam source; a primary electron optical system that comprises a primary system lens and guides the electron beam emitted from the electron beam source; a stage on which a sample to be irradiated with primary electrons guided by the primary electron optical system is arranged; a secondary electron optical system that comprises a secondary system lens and guides secondary charged particles emitted from the surface of the sample due to irradiation with the electron beam; a detector that detects the secondary charged particles guided by the secondary electron optical system;a gap control plate that is arranged above the stage so as to cover the surface of the sample arranged on the stage, and internally includes a through hole allowing the electron beam to pass therethrough; and
a cover member that is attached to a condenser lens arranged in the through hole in the secondary system lens, and blocks gap between the through hole and the condenser lens in view of a direction perpendicular to the gap control plate. |
地址 |
Tokyo JP |