发明名称 INSPECTION APPARATUS
摘要 An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.
申请公布号 US2015340193(A1) 申请公布日期 2015.11.26
申请号 US201514813768 申请日期 2015.07.30
申请人 EBARA CORPORATION 发明人 YOSHIKAWA Shoji;TSUKAMOTO Kiwamu;MURAKAMI Takeshi;HATAKEYAMA Masahiro;KARIMATA Tsutomu
分类号 H01J37/02;H01J37/20;H01J37/285 主分类号 H01J37/02
代理机构 代理人
主权项 1. An inspection apparatus for inspecting sample surface using an electron beam, comprising: an electron beam source; a primary electron optical system that comprises a primary system lens and guides the electron beam emitted from the electron beam source; a stage on which a sample to be irradiated with primary electrons guided by the primary electron optical system is arranged; a secondary electron optical system that comprises a secondary system lens and guides secondary charged particles emitted from the surface of the sample due to irradiation with the electron beam; a detector that detects the secondary charged particles guided by the secondary electron optical system;a gap control plate that is arranged above the stage so as to cover the surface of the sample arranged on the stage, and internally includes a through hole allowing the electron beam to pass therethrough; and a cover member that is attached to a condenser lens arranged in the through hole in the secondary system lens, and blocks gap between the through hole and the condenser lens in view of a direction perpendicular to the gap control plate.
地址 Tokyo JP