| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle to which an antistatic function is imparted in order to prevent a deterioration in a light shielding film of a photomask caused when using an exposure wavelength less than 200 nm. <P>SOLUTION: The pellicle which has high transparency for a deep UV light less than wavelength 200 nm and has antistatic function is characterized in that an antistatic layer which has high transparency for a deep UV light less than wavelength 200 nm and has conductivity is formed on at least one surface of the substrate having high transparency for a deep UV light less than wavelength 200 nm, and the pellicle is prepared by vacuum-vapor-depositing a metal fluoride which transmits exposure wavelength less than 200 nm and is a conductive material as the antistatic layer on a high-purity synthetic quartz glass. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
