| 发明名称 |
Etching Composition |
| 摘要 |
This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one metal corrosion inhibitor; 4) at least one organic solvent; 5) at least one amidine base; and 6) water. |
| 申请公布号 |
US2015267112(A1) |
申请公布日期 |
2015.09.24 |
| 申请号 |
US201514659663 |
申请日期 |
2015.03.17 |
| 申请人 |
Fujifilm Electronic Materials U.S.A., Inc. |
发明人 |
Dory Thomas;Kneer Emil A.;Takahashi Tomonori |
| 分类号 |
C09K13/00;H01L21/02;H01L23/532;H01L21/3213 |
主分类号 |
C09K13/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An etching composition, comprising:
1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one metal corrosion inhibitor; 4) at least one organic solvent; 5) at least one amidine base; and 6) water; wherein the composition has a pH between about 6.5 and about 9.5. |
| 地址 |
North Kingstown RI US |
