发明名称 MASK FOR FORMING ORGANIC LAYER PATTERN, FORMING METHOD OF ORGANIC LAYER PATTERN, AND MANUFACTURING METHOD OF ORGANIC LIGHT EMITTING DIODE DISPLAY USING THE SAME
摘要 A mask for forming an organic layer pattern, the mask including a photomask having a first substrate and a reflecting layer on the first substrate; and a donor substrate on the photomask and separated therefrom, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate the light and transmit the light to the donor substrate.
申请公布号 US2015270486(A1) 申请公布日期 2015.09.24
申请号 US201414532993 申请日期 2014.11.04
申请人 Samsung Display Co., Ltd. 发明人 Bang Hyun Sung;Kim Jae Sik;Lee Yeon Hwa;Lee Joon Gu;Choung Ji Young;Choi Jin Baek;Hwang Kyu Hwan;Song Young Woo
分类号 H01L51/00;H01L51/52;H01L51/56;G03F1/52;G03F7/20 主分类号 H01L51/00
代理机构 代理人
主权项 1. A mask for forming an organic layer pattern, the mask comprising: a photomask comprising a first substrate and a reflecting layer on the first substrate; and a donor substrate spaced from the photomask, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate light and transmit the light to the donor substrate.
地址 Yongin-City KR