发明名称 |
MASK FOR FORMING ORGANIC LAYER PATTERN, FORMING METHOD OF ORGANIC LAYER PATTERN, AND MANUFACTURING METHOD OF ORGANIC LIGHT EMITTING DIODE DISPLAY USING THE SAME |
摘要 |
A mask for forming an organic layer pattern, the mask including a photomask having a first substrate and a reflecting layer on the first substrate; and a donor substrate on the photomask and separated therefrom, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate the light and transmit the light to the donor substrate. |
申请公布号 |
US2015270486(A1) |
申请公布日期 |
2015.09.24 |
申请号 |
US201414532993 |
申请日期 |
2014.11.04 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Bang Hyun Sung;Kim Jae Sik;Lee Yeon Hwa;Lee Joon Gu;Choung Ji Young;Choi Jin Baek;Hwang Kyu Hwan;Song Young Woo |
分类号 |
H01L51/00;H01L51/52;H01L51/56;G03F1/52;G03F7/20 |
主分类号 |
H01L51/00 |
代理机构 |
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代理人 |
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主权项 |
1. A mask for forming an organic layer pattern, the mask comprising:
a photomask comprising a first substrate and a reflecting layer on the first substrate; and a donor substrate spaced from the photomask, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate light and transmit the light to the donor substrate. |
地址 |
Yongin-City KR |