| 摘要 |
PROBLEM TO BE SOLVED: To accurately drive a mobile object which holds a substrate during exposure.SOLUTION: An exposure apparatus comprises: a wafer stage device 12 having a stage WST for holding a wafer W; and an encoder system including a plurality of heads (46B, 46C, 46D etc.) for irradiating beams on reflection grating parts (44B, 44C, 44D etc.), respectively, which are arranged substantially parallel with an XY plane orthogonal to an optical axis AX of a projection optical system PL, the encoder system measuring a position of the stage WST; and a control system for controlling driving of the stage WST based on measured information of the encoder system. By an exposure operation of the wafer W, a position of the stage WST is measured by the encoder system. |
