发明名称 |
Magnetic sensor and manufacturing method therefor |
摘要 |
A magnetic sensor for detecting the intensity of a magnetic field in three axial directions, in which a plurality of giant magnetoresistive elements are formed on a single semiconductor substrate. A thick film is formed on the semiconductor substrate; giant magnetoresistive elements forming X-axis and Y-axis sensors are formed on a planar surface thereof; and giant magnetoresistive elements forming a Z-axis sensor are formed using slopes of channels in the thick film. Each of the slopes of the channels can be constituted of a first slope and a second slope, so that a magneto-sensitive element is formed on the second slope having a larger inclination angle. In order to optimize the slope shape and inclination with respect to each channel, it is possible to form a dummy slope that does not directly relate to the formation of the giant magnetoresistive elements. |
申请公布号 |
US9054028(B2) |
申请公布日期 |
2015.06.09 |
申请号 |
US201213459644 |
申请日期 |
2012.04.30 |
申请人 |
Yamaha Corporation |
发明人 |
Naito Hiroshi;Sato Hideki;Wakui Yukio;Omura Masayoshi |
分类号 |
G01R33/09;H01L21/00;H01L27/22;B82Y25/00;H01L43/12 |
主分类号 |
G01R33/09 |
代理机构 |
Dickstein Shapiro LLP |
代理人 |
Dickstein Shapiro LLP |
主权项 |
1. A manufacturing method for a magnetic sensor comprising:
forming a planation layer that provides planation by covering a wiring layer of a semiconductor substrate; forming a passivation film on the planation layer; forming a thick film on the passivation film; forming a resist film on the thick film; partially removing the resist film; performing etching on the resist film and the thick film, thus forming a plurality of channels in the thick film; forming an opening in the thick film to form a via; forming a wiring film on a planar surface of the thick film as well as slopes, top portions, and bottom portions of the channels; connecting the wiring film to a conductive portion of the via; forming magneto-sensitive elements on the slopes of the channels; and connecting the wiring film to the magneto-sensitive elements. |
地址 |
Hamamatsu-Shi, Shizuoka-Ken JP |