| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel acid generator especially useful for shorter wavelength imaging (193 nm imaging, EUV imaging or the like) and a photoresist composition containing one or a plurality of acid generators.SOLUTION: There are provided an acid generators containing a carbon cyclic aryl group or a hetero aromatic group having a structure represented by the formula (I) and substituted by at least an acetate part. These acid generators are especially useful as a photoresist composition component. In the formula (I), Z is a counter anion (non-nucleophilic anion, e.g. anion of carboxylate, sulphate, sulfonate, sulfamate, sulfonamide or sulfonimide or the like), X is S or I and R, R' and R'' are monovalent organic groups. |
