发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATOR FOR DISPLAY ELEMENT, METHOD FOR FORMING THE SAME AND DISPLAY ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in radiation sensitivity and resolution, and also in adhesion in development, and an interlayer insulator excellent in chemical resistance.SOLUTION: There is provided the radiation-sensitive resin composition which contains a copolymer, a radiation-sensitive compound and an organic solvent, and in which the copolymer contains a first structural unit derived from (meth)acrylic acid or unsaturated carboxylic acid anhydride, a second structural unit derived from glycidyl (meth)acrylate, 3,4-epoxy cyclohexyl methyl (meth)acrylate, 4-hydroxy butyl (meth)acrylate glycidyl ether or 3-(meth)acryloyloxy methyl-3-ethyl oxetane and a third structural unit derived from styrene, α-methylstyrene, 4-methylstyrene or 4-hydroxystyrene, the percentage content of the third structural unit in the total structural unit of the copolymer being 25 mol% to 80 mol%.
申请公布号 JP2015092233(A) 申请公布日期 2015.05.14
申请号 JP20140191602 申请日期 2014.09.19
申请人 JSR CORP 发明人 NAKANISHI TAKUYA;SHIMIZU MAKOTO;MATSUMURA SHINJI;TANGE SATOSHI
分类号 G03F7/038;C08F212/04 主分类号 G03F7/038
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