发明名称 Halvledaranordning och förfarande för att tillverka densamma
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce capacitance between a gate and a source, and between a gate and a drain, and prevent a gate for applying a voltage required for turning on a JFET (junction field effect transistor) from becoming high. <P>SOLUTION: A p<SP>+</SP>type gate region 4 is directly formed on the surface of an n<SP>-</SP>type channel layer 2 so that a part away from the n<SP>-</SP>type channel layer 2 becomes wide compared to a part contacting the n<SP>-</SP>type channel layer 2 out of the p<SP>+</SP>type gate region 4. The wide part of the p<SP>+</SP>type gate region 4 is made to be separated from the n<SP>-</SP>type channel layer 2 by a predetermined distance. For example, a recess 2a is formed on the n<SP>-</SP>type channel layer 2, and the p<SP>+</SP>type gate region 4 is formed in the recess 2a. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 SE537314(C2) 申请公布日期 2015.04.07
申请号 SE20110050081 申请日期 2011.02.04
申请人 DENSO CORPORATION 发明人 YUUICHI TAKEUCHI;RAJESH KUMAR MALHAN
分类号 H01L21/337;H01L21/02;H01L29/16;H01L29/772;H01L29/80;H01L29/808;H01L29/812 主分类号 H01L21/337
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