发明名称 PATTERN QUALITY MANAGEMENT CHART, PATTERN QUALITY MANAGEMENT METHOD, AND PATTERN FORMATION METHOD
摘要 A pattern quality management chart is provided with: a chart-use substrate comprising the same material as a substrate that is patterned by first areas having a predetermined affinity for functional liquid for patterning, and a second area having an affinity lower than the predetermined affinity; and at least one unit-area group formed upon the surface of the chart-use substrate. The unit-area group includes a plurality of unit areas which each comprise a first area surrounded therearound by a second area, wherein each unit area is classified into the following when functional liquid of a predetermined amount is supplied under predetermined supply conditions into the unit area: a compliant type unit area, which has a shape and a size such that the functional liquid does not overflow into the surrounding second area and such that the entirety of the unit area is filled with the functional liquid; and a non-compliant type unit area, which has a shape and a size such that a portion of the functional liquid overflows into the surrounding second area and/or part of the unit area is not filled with the functional liquid. The plurality of unit areas include at least one compliant type unit area and at least one non-compliant type unit area.
申请公布号 WO2015045510(A1) 申请公布日期 2015.04.02
申请号 WO2014JP65917 申请日期 2014.06.16
申请人 FUJIFILM CORPORATION 发明人 TATSUTA TAKEICHI
分类号 H01L21/288;H01L21/28;H05K3/00;H05K3/10 主分类号 H01L21/288
代理机构 代理人
主权项
地址