发明名称 フォトマスクおよびそれを用いた視差クロストークフィルタの製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a parallax crosstalk filter limiting the direction of image light and a manufacturing method for the parallax crosstalk filter to solve crosstalk in a three-dimensional display device performing naked eye stereoscopic vision. <P>SOLUTION: In the manufacturing method for the parallax crosstalk filter, a photosensitive material 22 on a substrate 21 is selectively exposed using a photomask 1 including a light-shielding film pattern 12 for surrounding an opening part 13 on a transparent substrate 11, an optical path inclination mechanism part 14 for refracting light 3 irradiated through the opening part 13 in an oblique direction, and a spacer 15 for holding a space with an exposure object substrate to provide a machining part 23 inclined to the surface of the photosensitive material 22. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5668488(B2) 申请公布日期 2015.02.12
申请号 JP20110009551 申请日期 2011.01.20
申请人 发明人
分类号 G03F1/00;G02B5/00;G03F1/38;G03F1/54 主分类号 G03F1/00
代理机构 代理人
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