| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fine pattern structure having a high aspect ratio. <P>SOLUTION: A manufacturing method of a fine pattern structure includes a step of sequentially laminating a transfer layer, and a heat reaction type resist layer on an etching layer; a step of making a prescribed region of the heat reaction type resist layer cause heat reaction, and thereafter etching the heat reacted region to pattern the heat reaction type resist layer; a step of patterning the transfer layer by applying first dry etching to the transfer layer by using the patterned heat reaction type resist layer as a mask; and a step of patterning the etching layer by applying second dry etching to the etching layer by using at least the patterned transfer layer as a mask. Specific materials are employed for the materials used for the transfer layer and the heat reaction type resist layer, and specific gasses are employed for etching gasses used for the first dry etching and the second dry etching. <P>COPYRIGHT: (C)2012,JPO&INPIT |
