METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES

摘要

A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure

主权项

1. A measurement system for measuring in a patterned structure having a periodic pattern, the system comprising:
a measurement unit comprising illumination and collection-detection assemblies configured and operable for, respectively, producing light of substantially broad wavelengths band onto the structure in a plane of incidence, and detecting light returned from the structure in response to the broadband illumination and generating output data comprising measured data indicative of the detected light,
wherein the illumination and collection-detection assemblies are configured to define at least two measurement channels including a normal incidence measurement channel and an oblique incidence measurement channel having at least one unified collection channel capable of detecting light portions of the returned light with zero or non-zero orders of diffraction; and a control unit configured and operable to be responsive to the generated measured data to analyze the measured data corresponding to the detected light portions of the returned light with zero and non-zero orders of diffraction and derive one or more parameters of the patterned structure from said output data.