Method of forming polyhedral oligomeric silsesquioxane compounds

摘要

A mixture of at least two polyhedral oligomeric silsesquioxane (POSS) compounds is formed in the presence of rhenium on cerium(IV) oxide. The POSS compounds are formed utilizing a method that includes the step of combining (a) a trihalosilane, (b) hydrogen gas, and (c) the rhenium on cerium(IV) oxide, in a reactor at a temperature of from 250° C. to 600° C. to form the mixture. The trihalosilane has the formula RSiX3 wherein R is an alkyl group having from 1 to 4 carbon atoms, an aryl group, and wherein X is a halo atom. This method allows for the efficient, predictable, and accurate production of the POSS compounds with a minimized need for use of expensive separation techniques. In addition, this method produces the POSS compounds in commercially useful quantities as major reaction products thereby avoiding the need to run multiple reactions.

主权项

1. A method of forming a mixture comprising at least two polyhedral oligomeric silsesquioxane (POSS) compounds in the presence of rhenium on cerium(IV) oxide, said method comprising the step of combining (a) a trihalosilane, (b) hydrogen gas, and (c) the rhenium on cerium(IV) oxide in a reactor at a temperature of from 250° C. to 600° C. to form the mixture, wherein the (a) trihalosilane has the formula RSiX3, R is an alkyl group having from 1 to 4 carbon atoms or an aryl group, and X is a halo atom.