JET SPRAY NOZZLE AND METHOD FOR CLEANING PHOTO MASKS AND SEMICONDUCTOR WAFERS

摘要

A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jet spray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jet spray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jet spray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jet spray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jet spray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.

主权项

1. A jet spray nozzle for cleaning a photolithographic mask or semiconductor wafer comprising:
a liquid supply inlet configured to introduce a liquid; a gas supply inlet configured to introduce a gas; a first plurality of gas injection nozzles communicating with the gas supply inlet; the first plurality of gas injection nozzles arranged to form a ring of spaced apart nozzles that are arranged about an axial centerline of the jet spray nozzle; and a jet spray nozzle outlet; wherein the jet spray nozzle is configured to combine the gas and the liquid to deliver a gas-liquid jet spray stream from the nozzle outlet.