发明名称 Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
摘要 This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
申请公布号 US8829247(B2) 申请公布日期 2014.09.09
申请号 US201013500715 申请日期 2010.09.27
申请人 Mitsubishi Gas Chemical Company, Inc. 发明人 Hayashi Hiromi;Echigo Masatoshi;Oguro Dai
分类号 C07C43/23;C07C41/30;C07C39/17 主分类号 C07C43/23
代理机构 Fitch, Even, Tabin & Flannery LLP 代理人 Fitch, Even, Tabin & Flannery LLP
主权项 1. A cyclic compound represented by the following formula (1): in the formula (1), L is independently a divalent group selected from the group consisting of a single bond, a linear or branched alkylene group having a carbon number of 1 to 20, a cycloalkylene group having a carbon number of 3 to 20, an arylene group having a carbon number of 6 to 24, —O—, —OC(═O)—, —OC(═O)O—, —N(R5)—C(═O)—, —N(R5)—C(═O)O—, —S—, —SO, —SO2— and any combination thereof; R1 is independently an alkyl group having a carbon number of 1 to 20, a cycloalkyl group having a carbon number of 3 to 20, an aryl group having a carbon number of 6 to 20, an alkoxyl group having a carbon number of 1 to 20, cyano group, nitro group, hydroxyl group, heterocyclic group, halogen, carboxyl group, an acyl group having a carbon number of 2 to 20, an alkylsilyl group having a carbon number of 1 to 20, or hydrogen atom, with the proviso that at least one R1 is a hydrogen atom; and R′ is independently represented by the following formula (1-2): in the formula (1-2),R6 is a hydrogen atom or a group selected from the group consisting of an alkyl group having a carbon number of 1 to 12, a cycloalkyl group having a carbon number of 3 to 12, an aryl group having a carbon number of 6 to 12, an alkoxy group having a carbon number of 1 to 12, cyano group, nitro group, heterocyclic group, halogen, carboxyl group, hydroxyl group and an alkylsilyl group having a carbon number of 1 to 12;n is an integer of 0 to 5;p is an integer of 0 to 5; andq is an integer of 0 to 5; R5 is hydrogen or an alkyl group having a carbon number of 1 to 10; and m is independently an integer of 1 to 4.
地址 Tokyo JP