发明名称 Protective film and encapsulation material comprising the same
摘要 Disclosed herein is a protective film. The protective film is produced by alternate coating of a polysilazane-based polymer and a flexible polysiloxane-based polymer. The polysilazane-based polymer is cured at low temperature to form silica, thereby achieving high hardness and high light transmittance. The protective film has improved interfacial adhesion between the respective coating films, which prevents permeation of moisture and oxygen. In addition, the protective film can be easily produced by low-temperature wet processes. Also disclosed herein is an encapsulation material comprising the protective film.
申请公布号 US8815404(B2) 申请公布日期 2014.08.26
申请号 US200812241976 申请日期 2008.09.30
申请人 Samsung Electronics Co., Ltd.;Cheil Industries Inc. 发明人 Lee Kwang Hee;Bulliard Xavier;Lyu Yi Yeol;Shin Hyeon Jin;Choi Yun Hyuk
分类号 B32B9/04;B32B13/04 主分类号 B32B9/04
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A protective film comprising one or more pairs of a first coating film and a second coating film, wherein the first coating film contains a polysilazane-based polymer and the second coating film contains a polysiloxane-based polymer comprising a C2 to C10 alkylene group in a backbone thereof, wherein the first and second coating films form alternating layers in the protective film, wherein the polysilazane-based polymer is represented by Formula 1: —(SiH2—NH)n—  (1)wherein n is a number from 500 to 1,000,000, wherein the polysiloxane-based polymer is prepared by hydrolysis and polycondensation of at least one compound represented by Formula 6:wherein R is C1-C3 alkyl group, X1, X2 and X3 are each independently a C1-C10 alkoxy group, n is an integer from 3 to 8 and m is an integer from 1 to 10, and at least one compound represented by Formula 7: RSiX1X2X3  (7)wherein R is C1-C3 alkyl group, and X1, X2 and X3 are each independently a C1-C10 alkoxy group, and wherein the second coating film further comprises a multi-functional cyclic siloxane compound represented by Formulas 10 or 13,
地址 KR
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