| 摘要 |
Apparatus for forming fine scale structures in the surface of a dielectric substrate 18 to two or more depths, the apparatus comprises: a first solid state laser 12 arranged to provide a first pulsed laser beam, a first mask 16 having a pattern for defining a first set of structures at a first depth, a projection lens 17 for forming a reduced size image of said pattern on the surface of the substrate 18 and a beam scanner arranged to scan said first pulsed laser beam in a two-dimensional raster scan relative to the first pattern to form a first set of structures at a first depth in the substrate, wherein the first 12 or a further solid state laser is arranged to form a second set of structures at a second depth in the substrate 18. Wherein the first solid state laser 12 may be a Q-switched continuous wave (CW) diode pumped laser. Also disclosed is a method of forming fine scale structures using said device. |
