COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a fine resist pattern, from which a pattern having high dry etching durability can be formed, and to provide a pattern forming method which reduces pipe clogging in a production process using the composition.SOLUTION: The composition for forming a fine pattern is used for minimizing a pattern by thickening a resist pattern in a process of forming a negative resist pattern using a chemically amplified resist composition; and the composition for forming a fine pattern comprises a polymer including a repeating unit having a hydroxyaryl group and an organic solvent that does not dissolve the negative resist pattern. The pattern forming method is carried out by using the composition for forming a fine pattern. In the pattern forming method, pipe clogging can be prevented by carrying out application of a resist composition and application of the composition for forming a fine pattern in the same coating apparatus.