SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

A semiconductor device includes a substrate having active regions, a conductive pattern which is formed on the active regions and has a first sidewall and a second sidewall, a first conducive line which faces the first sidewall with a first air spacer therebetween on the active regions, and a second conductive line which faces the second sidewall with a second air spacer therebetween on the active regions. The first air spacer and the second air spacer around the conductive pattern are asymmetrical.