发明名称 |
CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM |
摘要 |
A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus. |
申请公布号 |
US2014001369(A1) |
申请公布日期 |
2014.01.02 |
申请号 |
US201313958112 |
申请日期 |
2013.08.02 |
申请人 |
GIGAPHOTON INC. |
发明人 |
NISHISAKA TOSHIHIRO;WATANABE YUKIO;ABE TAMOTSU;WAKABAYASHI OSAMU |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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