| 摘要 |
<p>A novel method for manufacturing an acrylic acid ester derivative capable of providing high resolution and having excellent lithography properties such as LWR when used as one unit of the polymer that is included in a photoresist composition; as well as an intermediate of this derivative and a method for manufacturing the intermediate. Specifically, a compound (2) is obtained by reacting a compound (3) with an aldehyde in the presence of an acid, and then an acrylic acid compound is caused to react to produce an acrylic acid ester derivative (1). R1 is H or an alkyl; R2 is H or an alkyl which may be halogenated; X is O, S, or an alkylene which may contain O or S; and Y is Cl, Br, or I.</p> |
