| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern transfer method employing a stamper for transferring a fine pattern having a fine structure layer to improve a continuous transfer property of a resinous stamper and to allow accurate and continuous transfer.SOLUTION: A pattern transfer method for transferring an uneven pattern on a stamper to a photo-curable resin material comprises the steps of: pressing a stamper having a fine structure layer with a fine uneven pattern formed thereon onto a photo-curable resin material on a transfer target substrate; and curing the photo-curable resin material. The fine structure layer of the stamper is made of a polymer of a resin compound whose principal component is a silsesquioxane derivative having a curing mechanism different from a curing mechanism of the photo-curable resin material. Thereby, the uneven pattern on the stamper is transferred to the photo-curable resin material. |
