Process for controlling particle size and silica coverage in the preparation of titanium dioxide

摘要

The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid silicon halide and liquid titanium dioxide precursor into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200 °C to about 1600 °C to produce titanium dioxide particles that are substantially encapsulated in silicon dioxide.