发明名称 THROUGH SUBSTRATE VIA STRUCTURE AND METHOD FOR FABRICATING THE SAME
摘要 A through substrate via (TSV) structure is provided, including: a substrate; an opening formed in a portion of the semiconductor substrate; a dielectric layer formed on the sidewall of the opening; a conductive pillar formed inside the opening; and at least a portion of the dielectric layer is removed to form void. Also provided is a method for fabricating a through substrate via (TSV) structure.
申请公布号 US2013161825(A1) 申请公布日期 2013.06.27
申请号 US201113341846 申请日期 2011.12.30
申请人 HSU TZU-CHIEN;KU TZU-KUN;LIN CHA-HSIN;INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 HSU TZU-CHIEN;KU TZU-KUN;LIN CHA-HSIN
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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