| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain an excellent exposure pattern while suppressing fogging troubles. <P>SOLUTION: An exposure machine 44 comprises: a metallic backup roll 41; a light source 52; an optical mask plate 56; and mask support plates 57A and 57B. The backup roll 41 conveys a support film while supporting the rear surface of the support film 13 on which surface a curable film 27 is formed by a peripheral surface 41A. The light source 52 emits curing light to the curable film 27 on the support film 13 supported by the backup roll 41. The optical mask plate 56 blocks curing light. The optical mask 56 is disposed between the light source 52 and the backup roll 41 so as to be close to the backup roll 41 and has slits 56S which are extended in the X direction and are arranged in the Y direction. The mask support plates 57A and 57B are disposed between the optical mask plate 56 and the backup roll 41 and support the optical mask plate 56 from the side of the backup role 41. The mask support plates 57A and 57B scatter curing light more easily than the optical mask plate 56. <P>COPYRIGHT: (C)2013,JPO&INPIT |
