| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform accurate positioning at nano micron order in a drawing device which performs drawing on a wafer of silicon and the like with exposure using laser light. <P>SOLUTION: The drawing device for an optical element performs drawing of a dot pattern with a prescribed interval by reciprocating the laser light in a constant direction, and includes an illumination optical system for radiating the laser light, an XY stage for mounting a substrate, a nono-scale arranged on the XY stage for measuring relative position of the illumination optical system and the XY stage, an axis control unit for extracting a drawing start point of the return path on the basis of a reference position of the drawing signal on the substrate, data output of the drawing signal waveform, and the drawing end position of the dot pattern in the outward path that is measured by the nano-scale, and position correction means for correcting the position of the illumination optical system so as to start the drawing at the drawing start position extracted by the axis control unit. <P>COPYRIGHT: (C)2013,JPO&INPIT |
