| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical semiconductor device and a method for manufacturing the same, which enhance the reliability of the optical semiconductor device. <P>SOLUTION: A method for manufacturing an optical semiconductor device includes the steps of: etching a semiconductor substrate 1 to a halfway depth of the semiconductor substrate 1 to form a core 4a having a convex cross-sectional shape in the semiconductor substrate 1; forming oxidation prevention films 22 on one side face 4x and the other side face 4y of the core 4a, respectively; thermally oxidizing the surface of the semiconductor substrate 1 on both sides of the core 4a in a state where the oxidation prevention films 22 are formed thereon; forming a first impurity region on the semiconductor substrate 1 on the side of the one side face 4x of the core 4a; and forming a second impurity region on the semiconductor substrate 1 on the side of the other side face 4y of the core 4a. <P>COPYRIGHT: (C)2013,JPO&INPIT |
