| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment capable of forming a pattern of a curved line and a diagonal line easily and smoothly with high versatility. <P>SOLUTION: The exposure equipment comprises: a pattern generation part PG which generates a pattern with a predetermined resolution; and an optical device PL which projects an image of a pattern generated at the pattern generation part onto a member to be exposed S with a predetermined resolving power and a predetermined projection magnification. The predetermined resolution, the predetermined resolving power, and the predetermined projection magnification are set while having a predetermined correlation relationship. <P>COPYRIGHT: (C)2013,JPO&INPIT |
