METHOD OF PLASMA ETCHING AND PLASMA CHAMBER CLEANING USING F2 AND COF2,申请号EP20100771135-传众专利搜索

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发明名称	METHOD OF PLASMA ETCHING AND PLASMA CHAMBER CLEANING USING F2 AND COF2
摘要
申请公布号	EP2501837(A1)	申请公布日期	2012.09.26
申请号	EP20100771135	申请日期	2010.10.28
申请人	SOLVAY SA	发明人	RIVA, MARCELLO
分类号	C23C16/44;B08B7/00;C23F4/00;C23G5/00;H01J37/32;H01L21/3065;H01L21/311;H01L21/3213	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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