LITHOGRAPHIC APPARATUS, METHOD OF CALIBRATING LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To compensate disturbance on a mirror surface.

SOLUTION: A lithographic apparatus includes a system for compensating the effect of heat strain of a substrate table WT on position measurement of the substrate table WT by using lateral mirrors 66 and 68 in the substrate table WT. The lithographic apparatus is calibrated by using various substrate table scan loci, and measurement of rotation and local position of the lateral mirrors 66 and 68 in the substrate table WT. A dual stage lithographic apparatus is so provided with an alignment mark for specifying geometric shape of the lateral mirrors 66 and 68 used only by an exposure station, as to measure the geometric shape of the lateral mirrors 66 and 68 in the case where the substrate table WT is at a measurement station.

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