发明名称 |
MULTIPLE MATCHING REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING |
摘要 |
A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values. |
申请公布号 |
WO2012054263(A2) |
申请公布日期 |
2012.04.26 |
申请号 |
WO2011US55814 |
申请日期 |
2011.10.11 |
申请人 |
APPLIED MATERIALS, INC.;ZHANG, JIMIN;WANG, ZHIHONG;LEE, HARRY Q.;TU, WEN-CHIANG |
发明人 |
ZHANG, JIMIN;WANG, ZHIHONG;LEE, HARRY Q.;TU, WEN-CHIANG |
分类号 |
H01L21/304;H01L21/66 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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