| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique for forming an organic thin film patterned without bending a mask. <P>SOLUTION: A vapor releasing device 14 is arranged on a substrate 11, organic compound vapor is released from a nozzle 22 of a vapor source 21 in the vapor releasing device 14, the organic compound vapor having passed through an aperture 24 in a position facing the nozzle 22 is forced to reach a mask board 25 and to pass through a mask through hole 26, and a plurality of linear organic thin films are formed on a surface of the substrate 11 by a relative movement. Because the distance of the relative movement of the mask board 25 is shorter than the distance of the relative movement of the substrate 11, the mask 25 will not hang down. Because the organic compound vapor reaches the mask board 25 through the aperture 24, an oblique component is eliminated and a sharp pattern of the organic thin film can be obtained. <P>COPYRIGHT: (C)2012,JPO&INPIT |
