发明名称 NON-VOLATILE MEMORY ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a non-volatile memory that can be highly integrated with high reliability in operation and a method for manufacturing the same. SOLUTION: In the non-volatile memory element, a semiconductor substrate has a pair of sidewall channel regions that are disposed upwardly and are mutually opposed. A floating gate electrode fills a pair of the sidewall channel regions and is protruded on the semiconductor substrate. A control gate electrode is disposed on the semiconductor substrate so as to cover a part of the floating gate electrode. At least a pair of the sidewall channel regions are disposed as mutually opposed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009004751(A) 申请公布日期 2009.01.08
申请号 JP20080125228 申请日期 2008.05.12
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LEE TAKI;HYUN JAE-WOONG;PARK JU-HEE;YOO IN-KYEONG;PARK YOON-DONG;KIM WON-JOO;LEE JUNG-HOON
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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