发明名称 |
NON-VOLATILE MEMORY ELEMENT AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a non-volatile memory that can be highly integrated with high reliability in operation and a method for manufacturing the same. SOLUTION: In the non-volatile memory element, a semiconductor substrate has a pair of sidewall channel regions that are disposed upwardly and are mutually opposed. A floating gate electrode fills a pair of the sidewall channel regions and is protruded on the semiconductor substrate. A control gate electrode is disposed on the semiconductor substrate so as to cover a part of the floating gate electrode. At least a pair of the sidewall channel regions are disposed as mutually opposed. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009004751(A) |
申请公布日期 |
2009.01.08 |
申请号 |
JP20080125228 |
申请日期 |
2008.05.12 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
LEE TAKI;HYUN JAE-WOONG;PARK JU-HEE;YOO IN-KYEONG;PARK YOON-DONG;KIM WON-JOO;LEE JUNG-HOON |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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