| 摘要 |
<P>PROBLEM TO BE SOLVED: To detect silica particles for polishing remaining on a surface of a precision component. <P>SOLUTION: Polishing liquid contains silica particles containing in their composition at least any one of elements except the elements contained in the precision component as impurities out of the group of titanium, vanadium, zinc, gallium, germanium, rubidium, strontium, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, silver, indium, tin, antimony, tellurium, cesium, barium, hafnium, tantalum, tungsten, rhenium, iridium, platinum, gold, lead, bismuth, and rare earth elements. Impurities can be detected as a marker in a sample inspection process 10. <P>COPYRIGHT: (C)2012,JPO&INPIT |
