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发明名称
VERFAHREN ZUM FÜLLEN VON LÜCKEN UND VERFAHREN ZUR ABSCHEIDUNG VON MATERIALIEN UNTER VERWENDUNG EINER HOCHDICHTEN CHEMISCHEN PLASMA- GASPHASENABSCHEIDUNG
摘要
申请公布号
AT537556(T)
申请公布日期
2011.12.15
申请号
AT20040784663T
申请日期
2004.09.20
申请人
MICRON TECHNOLOGY, INC.
发明人
RUEGER, NEAL;BUDGE, WILLIAM;LI, WEIMIN;SANDHU, GURTEJ
分类号
H01L21/316;C23C16/04;C23C16/40;H01L21/762;H01L21/768
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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