INLINE SUBSTRATE-TREATING APPARATUS

摘要

Disclosed is an inline substrate-treating apparatus. The inline substrate-treating apparatus according to the present invention comprises a first chamber (100) in which a substrate (10) is pre-heated; a second chamber (200) in which the substrate (10) pre-heated in the first chamber (100) is transferred, heated and plasma-treated; and a third chamber (300) in which the substrate (10) plasma-treated in the second chamber (200) is transferred, cooled and plasma-treated, wherein the first chamber (100), the second chamber (200) and the third chamber (300) are sequentially connected and arranged in a line.