发明名称 Metal plating compositions
摘要 Disclosed are metal plating compositions for plating a metal on a substrate. The metal plating compositions include compounds which influence the leveling and throwing performance of the metal plating compositions. Also disclosed are methods of depositing metals on a substrate.
申请公布号 US8048284(B2) 申请公布日期 2011.11.01
申请号 US20080080484 申请日期 2008.04.02
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 REDDINGTON ERIK;DESMAISON GONZALO URRUTIA;NIAZIMBETOVA ZUKHRA I.;CLEARY DONALD E.;LEFEBVRE MARK
分类号 C25D3/56;C23C16/40;C23C18/36;C23C18/40;C23C18/44;C25D3/00;C25D3/46;C25D3/48;C25D3/50;C25D3/58;C25D3/60;C25D3/62 主分类号 C25D3/56
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