发明名称 SPECIMEN TREATMENT SYSTEM
摘要 <p>Provided is a specimen treatment system which has a greater flexibility in installation sites. A protruding part (2k) (protruding part (3k)) which protrudes downward is fixed to a bottom face (2f) (bottom face (3f)) of a first measuring unit (2) (a second measuring unit (3)) to be mounted on a mounting base (26) (mounting base (36)). A guide aperture (28) (guide aperture (38) is formed on an upper plate (26e) (upper plate (36e)) of the mounting base (26) (mounting base (36)), such that the protruding part (2k) (protruding part (3k)) fits therethrough rotatably in the horizontal direction while movement thereof in the horizontal direction is restricted.</p>
申请公布号 WO2011118190(A1) 申请公布日期 2011.09.29
申请号 WO2011JP01644 申请日期 2011.03.18
申请人 SYSMEX CORPORATION;TAKAI, KEI;KITAGAWA, NOBUHIRO 发明人 TAKAI, KEI;KITAGAWA, NOBUHIRO
分类号 G01N35/02 主分类号 G01N35/02
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