| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method capable of manufacturing a nanoimprint mold for manufacturing an optical element with high precision and coping with manufacturing of large-area products. SOLUTION: The manufacturing method comprises applying a photosensitive resist 4 on one side of a substrate 1, carrying out laser lithography to the photosensitive resist 4, developing the drawn image to form a mask pattern 5 having a desired opening pattern 5a, and etching the substrate 1 through the mask pattern 5 to a desired depth to obtain a mold 11. COPYRIGHT: (C)2011,JPO&INPIT
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