发明名称 Whiskerless plated structure and plating method
摘要 A plated structure is disclosed that includes a base formed of a copper-based material containing copper as a major component, a plating film formed of a tin-based material containing tin as a major component and provided over the base, and a tin-copper compound barrier film located at the boundary between the base and the plating film. The density of the tin-copper compound barrier film is greater than that of copper.
申请公布号 US7931760(B2) 申请公布日期 2011.04.26
申请号 US20060473014 申请日期 2006.06.23
申请人 FUJITSU LIMITED 发明人 SAKUYAMA SEIKI;SHIMIZU KOZO
分类号 B23K31/00 主分类号 B23K31/00
代理机构 代理人
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