发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce a feedback capacity, to improve a withstand voltage characteristic, and to increase a maximum available gain of a transistor element to improve the gain in a high frequency domain. SOLUTION: A semiconductor device includes: a gate electrode 2; a field plate electrode 7 formed over the gate electrode 2 through an insulating film 6; and an inductive element 8. The field plate electrode 7 is grounded through the inductive element 8. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010199241(A) 申请公布日期 2010.09.09
申请号 JP20090041264 申请日期 2009.02.24
申请人 FUJITSU LTD 发明人 INOUE YUSUKE
分类号 H01L21/8232;H01L21/338;H01L21/822;H01L27/04;H01L27/06;H01L27/095;H01L29/06;H01L29/778;H01L29/812 主分类号 H01L21/8232
代理机构 代理人
主权项
地址