Plasma etching chamber,申请号EP20070023156-传众专利搜索

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发明名称	Plasma etching chamber
摘要
申请公布号	EP1898444(B1)	申请公布日期	2010.09.08
申请号	EP20070023156	申请日期	2000.06.29
申请人	LAM RESEARCH CORPORATION	发明人	DAUGHERTY, JOHN E.;BENJAMIN, NEIL;BOGART, JEFF;VAHEDI, VAHID;COOPERBERG, DAVID;MILLER, ALAN;YAMAGUCHI, YOKO
分类号	H01J37/32;H05H1/46;H01L21/00;H01L21/302;H01L21/3065;H01L21/687	主分类号	H01J37/32
代理机构		代理人
主权项
地址

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