| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electrostatic attraction holding device which can enhance the flatness of a body to be attracted to an attraction surface, and to provide an aligner, an exposure method, and a method of manufacturing a device. <P>SOLUTION: A second electrostatic attraction holding device 34 includes a base 42 formed of a dielectric material with flexibility and having one surface 42b where an attraction surface 34a for attracting a wafer W is formed, a first electrode part 45 and a second electrode part 46 provided in the base 42, and a driving device 41 which applies driving force to the other surface 42a of the base 42 on the opposite side from the one surface 42b to change the shape of the attraction surface 34a of the base 42. When the shape of the attraction surface 34a is changed through the driving of the driving device 41, the flatness is improved of an irradiated surface Wa of the wafer electrostatically attracted to the attraction surface 34a. <P>COPYRIGHT: (C)2010,JPO&INPIT |
