发明名称 Integrated circuit with intergrated capacitor and methods for making same
摘要 An explanation is given of, inter alia, a circuit arrangement in which an intermediate layer (160) made of a dielectric material is arranged between two metal layers (102 and 104). The intermediate layer (160) is designed in such a way that the capacitance per unit area between the connection layers (102, 104) is greater than 0.5 fF/μm2.
申请公布号 US7759768(B2) 申请公布日期 2010.07.20
申请号 US20050513057 申请日期 2005.06.02
申请人 INFINEON TECHNOLOGIES AG 发明人 BARTH HANS-JOACHIM;HOLZ JUERGEN
分类号 H01L21/768;H01L23/52;H01L21/822;H01L23/522;H01L27/04 主分类号 H01L21/768
代理机构 代理人
主权项
地址