发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <p>A semiconductor device includes an oxide semiconductor thin film layer primarily including zinc oxide having at least one orientation other than (002) orientation. The zinc oxide may have a mixed orientation including (002) orientation and (101) orientation. Alternatively, the zinc oxide may have a mixed orientation including (100) orientation and (101) orientation.</p>
申请公布号 KR100971579(B1) 申请公布日期 2010.07.20
申请号 KR20077020216 申请日期 2007.02.13
申请人 发明人
分类号 H01L29/786;C23C16/40;G02F1/136 主分类号 H01L29/786
代理机构 代理人
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