PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR ELEMENT MANUFACTURED BY SUCH APPARATUS,申请号EP20060843042-传众专利搜索

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发明名称	PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR ELEMENT MANUFACTURED BY SUCH APPARATUS
摘要
申请公布号	EP1981068(A4)	申请公布日期	2010.05.26
申请号	EP20060843042	申请日期	2006.12.22
申请人	SHARP KABUSHIKI KAISHA	发明人	KISHIMOTO, KATSUSHI;FUKUOKA, YUSUKE
分类号	H01L21/205;H01L21/3065	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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