PATTERN CLEANING METHOD AND PATTERN CLEANING DEVICE

摘要

PURPOSE: A method and a device for cleaning a pattern are provided to remove a non-uniform pattern from a substrate by applying optical-near-field photo-dissociation to a roughened part of the pattern. CONSTITUTION: A substrate, on which a pattern is formed, is located in a chamber. A reaction gas is injected into the chamber(S100). A laser with photo energy is radiated onto the substrate. Optical-near-field photo-dissociation is applied on the rough surface of a pattern. The optical-near-field photo-dissociation vibrates the reaction gas. The reaction gas physically or chemically interacts with the roughened part of the pattern(S200).