| 摘要 |
An exposure apparatus for exposing a substrate to radiant energy, the substrate being conveyed from a processing apparatus including a coater that coats the substrate with a photoresist and an auxiliary regulator that regulates a temperature of the substrate, the exposure apparatus comprising a measurement device configured to measure the temperature of the substrate, a main regulator configured to regulate a temperature of the substrate prior to exposure of the substrate based on an output from the measurement device, and a controller configured to determine temperature control information used to control regulation of the temperature of the substrate in the auxiliary regulator based on an output from the measurement device, and to transmit the determined temperature control information to the processing apparatus. |
