<p>A method is provided. A first layer is provided over a substrate, the first layer comprising a first material. A patterned second layer is applied over the first layer via stamping. The second layer comprising a second material. The second layer covers a first portion of the first layer, and does not cover a second portion of the first layer. The second portion of the first layer is removed via a subtractive process while the first portion of the first layer is protected from removal by the patterned second layer.</p>
申请公布号
WO2010039940(A1)
申请公布日期
2010.04.08
申请号
WO2009US59205
申请日期
2009.10.01
申请人
THE REGENTS OF THE UNIVERSITY OF MICHIGAN;FORREST, STEPHEN R.;MIHNEV, MOMCHIL T.;TAYLOR, ANDRE D.;XU, XIN
发明人
FORREST, STEPHEN R.;MIHNEV, MOMCHIL T.;TAYLOR, ANDRE D.;XU, XIN