发明名称 PATTERNING BY STAMPED METAL RESIST
摘要 <p>A method is provided. A first layer is provided over a substrate, the first layer comprising a first material. A patterned second layer is applied over the first layer via stamping. The second layer comprising a second material. The second layer covers a first portion of the first layer, and does not cover a second portion of the first layer. The second portion of the first layer is removed via a subtractive process while the first portion of the first layer is protected from removal by the patterned second layer.</p>
申请公布号 WO2010039940(A1) 申请公布日期 2010.04.08
申请号 WO2009US59205 申请日期 2009.10.01
申请人 THE REGENTS OF THE UNIVERSITY OF MICHIGAN;FORREST, STEPHEN R.;MIHNEV, MOMCHIL T.;TAYLOR, ANDRE D.;XU, XIN 发明人 FORREST, STEPHEN R.;MIHNEV, MOMCHIL T.;TAYLOR, ANDRE D.;XU, XIN
分类号 H01L51/00 主分类号 H01L51/00
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